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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 845XRD Investigations on Film Thickness and Substrate...

XRD Investigations on Film Thickness and Substrate Temperature Effects of DC Magnetron Sputtered ZnO Films

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Abstract:

In this paper, direct current plasma magnetron sputter deposition technique was employed to deposit zinc oxide (ZnO) films on glass substrates. The magnetron sputtering process parameters including film thickness and substrate temperature were investigated. The crystallite sizes of the ZnO films were extracted from the measured X-ray diffraction patterns. The correlation of the crystallite size of the ZnO films with the film thickness and the substrate temperature will be discussed in this paper.

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Materials, Industrial, and Manufacturing Engineering Research Advances 1.1

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Periodical:

Advanced Materials Research (Volume 845)

Pages:

241-245

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.845.241

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Online since:

December 2013

Authors:

Jian Wei Hoon*, Kah Yoong Chan, Cheng Yang Low

Keywords:

Crystallinity, Magnetron Sputtering, ZNO

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

* - Corresponding Author

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