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Improving the Structural, Optical and Electrical Properties of ITO Nano-Layered Thin Films by Gas Flow Argon

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Abstract:

Indium tin oxide (ITO) thin films of 150 nm thickness were deposited on quartz glass substrates by RF sputtering technique, followed by thermal annealing treatment. In this technique, the samples have been annealed at different temperature, 300OC, 400OC, 500OC respectively in Argon gas flow. Structural and surface morphological properties were analyzed by X-ray diffraction (XRD) and Atomic Force Microscopy (AFM) after annealing. The XRD showed a polycrystalline structure of ITO film with maximum peak intensity at 2θ= 30.54, <222> orientation without any change in the cubic structure. Continuous and homogeneous films obtained by the AFM after annealing treatment. The visible spectrum from the spectrophotometer showed high transparency between 81% and 95% in the. Increasing the annealing temperature yields evenly distributed pyramidal peaks shaped particles with low roughness. Resistance of ITO thin film was significantly improved from 8.75 kΩ to 1.96 kΩ after 10 minute from 300OC to 500OC annealing temperatures respectively under Argon gas flow. ITO films physical properties would be well improved by this method which is highly suitable for cost effective photonic devices.

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Periodical:

Advanced Materials Research (Volume 974)

Pages:

116-120

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.974.116

Citation:

Cite this paper

Online since:

June 2014

Authors:

Q.Z. Mehdi*, Gurumurthy Hegde, Mohamad Ashry Bin Juusoh, Jinan B. Al-Dabbagh, Naser Mahmoud Ahmed

Keywords:

ITO Argon Gas Flow, Resistance, Transparent Films

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* - Corresponding Author

References

[1] Gurumurthy Hegde, Yuvaraj A R, Gan Siew Mei , Siti Aisyah Mustapha, Mashitah M Yusoff, V.G. Chigrinov, Proc. of SPIE Vol. 9005 (2014) 90050B-90050B-6.

Google Scholar

[2] RA Alla, G Hegde, L Komitov, Applied Physics Letters 102 (23) (2013) 233505; M Qasim, JB Al-Dabbagh, AN Abdalla, MM Yusoff, G Hegde, Nano Hybrids 4 (2013) 21-31.

DOI: 10.4028/www.scientific.net/nh.4.21

Google Scholar

[3] O Elamain, G Hegde, L Komitov, Applied Physics Letters Vol 103 (2) (2013) 023301.

Google Scholar

[4] Ramesh M. Krishna, Materials Letters 66 (2012) 233–235.

Google Scholar

[5] S. Worasukhkhunga, Procedia Engineering 00 (2012) 780 – 786.

Google Scholar

[6] Sung Mook Chung, Ceramics International 38S (2012) S617–S621.

Google Scholar

[7] A. Solieman, M.A. Aegerter, Thin Solid Films 502 (2006) 205–211.

Google Scholar

[8] L.R. Cruz, C. Legnani, I.G. Matoso, C.L. Ferreria, H.R. Moutinho, Materials Research Bulletin 39 (2004) 993–1003.

Google Scholar

[9] H. Han, J.W. Mayer, T.L. Alford, Journal of Applied Physics 100 (2006) 083715, 1–083715, 6.

Google Scholar

[10] T. Minami, Thin Solid Films 516 (2008) 5822–5828.

Google Scholar

[11] D. -S. Liu, C. -S. Sheu, C. -T. Lee, C. -H. Lin, Thin Solid Films 516 (2008) 3196–3203.

Google Scholar

[12] C. –H. Yang, S. -C. Lee, T. -C. Lin, W. -Y. Zhuang, Materials Science Engineering B 134 (2006) 68–75.

Google Scholar

[13] Y.M. Kang, S.H. Kwon, J.H. Choi, Y.J. Cho, P.K. Song, Thin Solid Films 518 (2010) 3081–3084.

Google Scholar

[14] M.M. El-Nahass, Materials Science and Engineering B 177 (2012) 145– 150.

Google Scholar

[15] A. Solieman, Materials Chemistry and Physics 134 (2012) 127– 132.

Google Scholar

[16] B. Leif Hanson, Radiation Measurements 46 (2011) 1595e1597.

Google Scholar

[17] C.J. Lee, Thin Solid Films 522 (2012) 330–335.

Google Scholar

[18] C. Guillén, Materials Chemistry and Physics 112 (2008) 641–644.

Google Scholar

[19] Chang S. Moon, Jeon G. Han, Thin Solid Films 516 (2008) 6560–6564.

Google Scholar

[20] Y. Masuda, N. Saito, R. Hoffmann, M.R. De Guire, K. Koumoto, Sci. Technol. Adv. Mater. 4 (2003) 461.

Google Scholar

[21] E. Williams, K. Haavisto, J. Li, G. Jabbour, Adv. Mater. 19 (2007) 197.

Google Scholar

[22] A.R. Duggal, J.J. Shiang, C.M. Heller, D.F. Foust, Appl. Phys. Lett. 80 (2002) 3470.

Google Scholar

[23] Y. -H. Tak, K. -B. Kim, H. -G. Park, K. -H. Lee, J. -R. Lee, Thin Solid Films 411 (2002) 12.

Google Scholar

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