Paper Titles

Effect of Preparation-Induced Surface Morphology on the Stability of H-Terminated Si(111) and Si(100) Surfaces
p.179

Thermal Evolution of (100) Silicon and Chemical Oxides as Seen by ATR Spectroscopy
p.183

Modelling the Growth of Chemical Oxide for Advanced Surface Preparation
p.187

Wafer Surface Preparation Requirements for Next-Generation Devices
p.191

Cleaning of Si Surfaces by Lamp Illumination
p.195

Defect-Free Si Thinning by In Situ HCI Vapour Etching
p.199

Advanced Cylindrical Capacitor Formation Using Gas-Phase Selective Etching
p.203

Gas-Phase HF/Vapor Etching of Thermal Silicon Dioxide Films
p.207

Electrochemical Impedance Spectroscopic Characterization of Hydrophobic Coatings Deposited onto Pre-Oxidized Silicon
p.211

HomeSolid State PhenomenaSolid State Phenomena Vol. 92Cleaning of Si Surfaces by Lamp Illumination

Cleaning of Si Surfaces by Lamp Illumination

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

195-198

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.195

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Cite this paper

Online since:

May 2003

Authors:

Adrien Danel, Chia Liang Tsai, K. Shanmugasundaram, F. Tardif, E. Kamieniecki, Jerzy Ruzyllo

Keywords:

Hydrocarbons, Lamp Cleaning, Organic Contamination, VolatileContaminants

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