Paper Titles
Effect of Preparation-Induced Surface Morphology on the Stability of H-Terminated Si(111) and Si(100) Surfaces
p.179
Thermal Evolution of (100) Silicon and Chemical Oxides as Seen by ATR Spectroscopy
p.183
Modelling the Growth of Chemical Oxide for Advanced Surface Preparation
p.187
Wafer Surface Preparation Requirements for Next-Generation Devices
p.191
Cleaning of Si Surfaces by Lamp Illumination
p.195
Defect-Free Si Thinning by In Situ HCI Vapour Etching
p.199
Advanced Cylindrical Capacitor Formation Using Gas-Phase Selective Etching
p.203
Gas-Phase HF/Vapor Etching of Thermal Silicon Dioxide Films
p.207
Electrochemical Impedance Spectroscopic Characterization of Hydrophobic Coatings Deposited onto Pre-Oxidized Silicon
p.211

Cleaning of Si Surfaces by Lamp Illumination

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

195-198

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.195

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Online since:

May 2003

Authors:

Adrien Danel, Chia Liang Tsai, K. Shanmugasundaram, F. Tardif, E. Kamieniecki, Jerzy Ruzyllo

Keywords:

Hydrocarbons, Lamp Cleaning, Organic Contamination, VolatileContaminants

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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